CVD CVI materials

AVS temperature, vacuum and gas control technologies, coupled with superior system integration capabilities, are well-suited to CVD and CVI applications. AVS gas and vapor delivery systems coordinate mass flow controls and modulating valves to deliver reactant and carrier gases such as nitrogen, hydrogen, argon, methane, silicon tetrachloride, methyl trichlorosilane, boron trichloride, carbon dioxide, ammonia and others. AVS furnaces have been successfully used in the chemical vapor depositions of silicon carbide, boron nitride, silicon nitride, zinc selenide, zinc sulfide and pyrolytic carbon.